- Ruhr-Universität Bochum
Scientific output
Publications
Below, you can either scroll through the complete list of our annually published research in peer-reviewed journals or search for a specific author or keyword via the free text search.
- 2024 • 71
Wafer-Scale Demonstration of Polycrystalline MoS2 Growth on 200 mm Glass and SiO2/Si Substrates by Plasma-Enhanced Atomic Layer Deposition
Jagosz, J. and Willeke, L. and Gerke, N. and Becher, M. J. M. J. and Plate, P. and Kostka, A. and Rogalla, D. and Ostendorf, A. and Bock, C.
ADVANCED MATERIALS TECHNOLOGIES. Volume: 9 (2024) - 2023 • 70
Direct-Patterning ZnO Deposition by Atomic-Layer Additive Manufacturing Using a Safe and Economical Precursor
Stefanovic, S. and Gheshlaghi, N. and Zanders, D. and Kundrata, I. and Zhao, B. and Barr, M. K. S. and Halik, M. and Devi, A. and Bachmann, J.
SMALL. Volume: 19 (2023) - 2023 • 69
Interplay of Precursor and Plasma for The Deposition of HfO2 via PEALD: Film Growth and Dielectric Properties
Preischel, F. and Zanders, D. and Berning, T. and Kostka, A. and Rogalla, D. and Bock, C. and Devi, A.
ADVANCED MATERIALS INTERFACES. Volume: 10 (2023) - 2023 • 68
Ultrashort-Pulsed-Laser Annealing of Amorphous Atomic-Layer-Deposited MoS2 Films
Becher, M. J. M. J. and Jagosz, J. and Neubieser, R. and Wree, J. and Devi, A. and Michel, M. and Bock, C. and Gurevich, E. L. and Ostendorf, A.
ADVANCED ENGINEERING MATERIALS. Volume: 25 (2023) - 2023 • 67
PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films
de los Arcos, T. and Awakowicz, P. and Böke, M. and Boysen, N. and Brinkmann, R. P. and Dahlmann, R. and Devi, A. and Eremin, D. and Franke, J. and Gergs, T. and Jenderny, J. and Kemaneci, E. and Kühne, T. D. and Kusmierz, S. and Mussenbrock, T. and Rubner, J. and Trieschmann, J. and Wessling, M. and Xie, X. and Zanders, D. and Zysk, F. and Grundmeier, G.
PLASMA PROCESSES AND POLYMERS. Volume: (2023) - 2023 • 66
In Pursuit of Next Generation N-Heterocyclic Carbene-Stabilized Copper and Silver Precursors for Metalorganic Chemical Vapor Deposition and Atomic Layer Deposition Processes
Selvakumar, I. and Boysen, N. and Bürger, M. and Devi, A.
CHEMISTRY (SWITZERLAND). Volume: 5 (2023) - 2023 • 65
Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al2O3 atomic layer deposition
Xie, X. and Zanders, D. and Preischel, F. and de los Arcos, T. and Devi, A. and Grundmeier, G.
SURFACE AND INTERFACE ANALYSIS. Volume: 55 (2023) - 2023 • 64
Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It
Weber, M. and Boysen, N. and Graniel, O. and Sekkat, A. and Dussarrat, C. and Wiff, P. and Devi, A. and Muñoz-Rojas, D.
ACS MATERIALS AU. Volume: 3 (2023) - 2022 • 63
Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide Thin Films at Low Temperatures for Hydrogen Gas Sensing
Wree, J.-L. and Rogalla, D. and Ostendorf, A. and Schierbaum, K.D. and Devi, A.
ACS APPLIED MATERIALS AND INTERFACES. Volume: (2022) - 2022 • 62
Role of Anionic Backbone in NHC-Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition**
Boysen, N. and Philip, A. and Rogalla, D. and Karppinen, M. and Devi, A.
CHEMISTRY - A EUROPEAN JOURNAL. Volume: (2022) - 2022 • 61
Trimethylamine Probes Isolated Silicon Dangling Bonds and Surface Hydroxyls of (H,OH)-Si(001)
Ramírez, L.P. and Fornefeld, N. and Bournel, F. and Kubsky, S. and Magnano, E. and Bondino, F. and Köhler, U. and Carniato, S. and Gallet, J.-J. and Rochet, F.
JOURNAL OF PHYSICAL CHEMISTRY C. Volume: 126 (2022) - 2022 • 60
Molecular Permeation in Freestanding Bilayer Silica
Naberezhnyi, D. and Mai, L. and Doudin, N. and Ennen, I. and Hütten, A. and Altman, E.I. and Devi, A. and Dementyev, P.
NANO LETTERS. Volume: 22 (2022) - 2022 • 59
Influence of surface activation on the microporosity of PE-CVD and PE-ALD SiOx thin films on PDMS
Hoppe, C. and Mitschker, F. and Mai, L. and Liedke, M.O. and de los Arcos, T. and Awakowicz, P. and Devi, A. and Attallah, A.G. and Butterling, M. and Wagner, A. and Grundmeier, G.
PLASMA PROCESSES AND POLYMERS. Volume: (2022) - 2022 • 58
Silver Thin-Film Electrodes Grown by Low-Temperature Plasma-Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure
Hasselmann, T. and Misimi, B. and Boysen, N. and Zanders, D. and Wree, J.-L. and Rogalla, D. and Haeger, T. and Zimmermann, F. and Brinkmann, K.O. and Schädler, S. and Theirich, D. and Heiderhoff, R. and Devi, A. and Riedl, T.
ADVANCED MATERIALS TECHNOLOGIES. Volume: (2022) - 2021 • 57
Atomic Layer Deposition of Copper Metal Films from Cu(acac)2 and Hydroquinone Reductant
Tripathi, T.S. and Wilken, M. and Hoppe, C. and de los Arcos, T. and Grundmeier, G. and Devi, A. and Karppinen, M.
ADVANCED ENGINEERING MATERIALS. Volume: 23 (2021) - 2021 • 56
Atomic layer deposition of dielectric Y2O3thin films from a homoleptic yttrium formamidinate precursor and water
Boysen, N. and Zanders, D. and Berning, T. and Beer, S.M.J. and Rogalla, D. and Bock, C. and Devi, A.
RSC ADVANCES. Volume: 11 (2021) - 2021 • 55
Fabrication of Gd: XFeyOzfilms using an atomic layer deposition-type approach
Yu, P. and Beer, S.M.J. and Devi, A. and Coll, M.
CRYSTENGCOMM. Volume: 23 (2021) - 2021 • 54
A study on the influence of ligand variation on formamidinate complexes of yttrium: New precursors for atomic layer deposition of yttrium oxide
Beer, S.M.J. and Boysen, N. and Muriqi, A. and Zanders, D. and Berning, T. and Rogalla, D. and Bock, C. and Nolan, M. and Devi, A.
DALTON TRANSACTIONS. Volume: 50 (2021) - 2021 • 53
Investigation of an atomic-layer-deposited Al2O3 diffusion barrier between Pt and Si for the use in atomic scale atom probe tomography studies on a combinatorial processing platform
Li, Y. and Zanders, D. and Meischein, M. and Devi, A. and Ludwig, A.
SURFACE AND INTERFACE ANALYSIS. Volume: 53 (2021) - 2021 • 52
Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for Low-Resistivity Co Thin Films
Zanders, D. and Liu, J. and Obenlüneschloß, J. and Bock, C. and Rogalla, D. and Mai, L. and Nolan, M. and Barry, S.T. and Devi, A.
CHEMISTRY OF MATERIALS. Volume: (2021) - 2021 • 51
Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application
Kaur, P. and Mai, L. and Muriqi, A. and Zanders, D. and Ghiyasi, R. and Safdar, M. and Boysen, N. and Winter, M. and Nolan, M. and Karppinen, M. and Devi, A.
CHEMISTRY - A EUROPEAN JOURNAL. Volume: 27 (2021) - 2021 • 50
(tBuN)SiMe2NMe2-A new N,N ′-κ 2-monoanionic ligand for atomic layer deposition precursors
Griffiths, M.B.E. and Zanders, D. and Land, M.A. and Masuda, J.D. and Devi, A. and Barry, S.T.
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A: VACUUM, SURFACES AND FILMS. Volume: 39 (2021) - 2020 • 49
A new metalorganic chemical vapor deposition process for MoS2with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur
Wree, J.-L. and Ciftyurek, E. and Zanders, D. and Boysen, N. and Kostka, A. and Rogalla, D. and Kasischke, M. and Ostendorf, A. and Schierbaum, K. and Devi, A.
DALTON TRANSACTIONS. Volume: 49 (2020) - 2020 • 48
A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films
Boysen, N. and Misimi, B. and Muriqi, A. and Wree, J.-L. and Hasselmann, T. and Rogalla, D. and Haeger, T. and Theirich, D. and Nolan, M. and Riedl, T. and Devi, A.
CHEMICAL COMMUNICATIONS. Volume: 56 (2020) - 2020 • 47
Hierarchical highly ordered SnO2 nanobowl branched ZnO nanowires for ultrasensitive and selective hydrogen sulfide gas sensing
Zhu, L.-Y. and Yuan, K.-P. and Yang, J.-H. and Hang, C.-Z. and Ma, H.-P. and Ji, X.-M. and Devi, A. and Lu, H.-L. and Zhang, D.W.
MICROSYSTEMS AND NANOENGINEERING. Volume: 6 (2020) - 2020 • 46
From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
Mai, L. and Mitschker, F. and Bock, C. and Niesen, A. and Ciftyurek, E. and Rogalla, D. and Mickler, J. and Erig, M. and Li, Z. and Awakowicz, P. and Schierbaum, K. and Devi, A.
SMALL. Volume: 16 (2020) - 2020 • 45
Impermeable Charge Transport Layers Enable Aqueous Processing on Top of Perovskite Solar Cells
Gahlmann, T. and Brinkmann, K.O. and Becker, T. and Tückmantel, C. and Kreusel, C. and van gen Hassend, F. and Weber, S. and Riedl, T.
ADVANCED ENERGY MATERIALS. Volume: 10 (2020) - 2020 • 44
A Rare Low-Spin CoIV Bis(β-silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration
Zanders, D. and Bačić, G. and Leckie, D. and Odegbesan, O. and Rawson, J. and Masuda, J.D. and Devi, A. and Barry, S.T.
ANGEWANDTE CHEMIE - INTERNATIONAL EDITION. Volume: 59 (2020) - 2019 • 43
Fabrication of heterostructured p-CuO/n-SnO 2 core-shell nanowires for enhanced sensitive and selective formaldehyde detection
Zhu, L.-Y. and Yuan, K. and Yang, J.-G. and Ma, H.-P. and Wang, T. and Ji, X.-M. and Feng, J.-J. and Devi, A. and Lu, H.-L.
SENSORS AND ACTUATORS, B: CHEMICAL. Volume: (2019) - 2019 • 42
Up-converting ALD/MLD thin films with Yb3+, Er3+ in amorphous organic framework
Tuomisto, M. and Giedraityte, Z. and Mai, L. and Devi, A. and Boiko, V. and Grzeszkiewicz, K. and Hreniak, D. and Karppinen, M. and Lastusaari, M.
JOURNAL OF LUMINESCENCE. Volume: 213 (2019) - 2019 • 41
Towards maximized utilization of iridium for the acidic oxygen evolution reaction
Ledendecker, M. and Geiger, S. and Hengge, K. and Lim, J. and Cherevko, S. and Mingers, A.M. and Göhl, D. and Fortunato, G.V. and Jalalpoor, D. and Schüth, F. and Scheu, C. and Mayrhofer, K.J.J.
NANO RESEARCH. Volume: 12 (2019) - 2019 • 40
Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide
Mai, L. and Boysen, N. and Zanders, D. and de los Arcos, T. and Mitschker, F. and Mallick, B. and Grundmeier, G. and Awakowicz, P. and Devi, A.
CHEMISTRY - A EUROPEAN JOURNAL. Volume: 25 (2019) - 2019 • 39
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices
Mai, L. and Zanders, D. and Subaşl, E. and Ciftyurek, E. and Hoppe, C. and Rogalla, D. and Gilbert, W. and Arcos, T.D.L. and Schierbaum, K. and Grundmeier, G. and Bock, C. and Devi, A.
ACS APPLIED MATERIALS AND INTERFACES. Volume: (2019) - 2019 • 38
PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
Zanders, D. and Ciftyurek, E. and Subaşl, E. and Huster, N. and Bock, C. and Kostka, A. and Rogalla, D. and Schierbaum, K. and Devi, A.
ACS APPLIED MATERIALS AND INTERFACES. Volume: 11 (2019) - 2018 • 37
Atomic/molecular layer deposition of Cu-organic thin films
Hagen, D.J. and Mai, L. and Devi, A. and Sainio, J. and Karppinen, M.
DALTON TRANSACTIONS. Volume: 47 (2018) - 2018 • 36
An N-Heterocyclic Carbene Based Silver Precursor for Plasma-Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure
Boysen, N. and Hasselmann, T. and Karle, S. and Rogalla, D. and Theirich, D. and Winter, M. and Riedl, T. and Devi, A.
ANGEWANDTE CHEMIE - INTERNATIONAL EDITION. Volume: 57 (2018) - 2018 • 35
Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Properties
Mattinen, M. and Wree, J.-L. and Stegmann, N. and Ciftyurek, E. and Achhab, M.E. and King, P.J. and Mizohata, K. and Räisänen, J. and Schierbaum, K.D. and Devi, A. and Ritala, M. and Leskelä, M.
CHEMISTRY OF MATERIALS. Volume: 30 (2018) - 2018 • 34
Water assisted atomic layer deposition of yttrium oxide using tris(N,N0-diisopropyl-2-dimethylamido-guanidinato) yttrium(III): Process development, film characterization and functional properties†
Mai, L. and Boysen, N. and Subaşı, E. and De Los Arcos, T. and Rogalla, D. and Grundmeier, G. and Bock, C. and Lu, H.-L. and Devi, A.
RSC ADVANCES. Volume: 8 (2018) - 2018 • 33
PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
Gebhard, M. and Mai, L. and Banko, L. and Mitschker, F. and Hoppe, C. and Jaritz, M. and Kirchheim, D. and Zekorn, C. and De Los Arcos, T. and Grochla, D. and Dahlmann, R. and Grundmeier, G. and Awakowicz, P. and Ludwig, Al. and Devi, A.
ACS APPLIED MATERIALS AND INTERFACES. Volume: 10 (2018) - 2018 • 32
A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
Gebhard, M. and Mitschker, F. and Hoppe, C. and Aghaee, M. and Rogalla, D. and Creatore, M. and Grundmeier, G. and Awakowicz, P. and Devi, A.
PLASMA PROCESSES AND POLYMERS. Volume: 15 (2018) - 2018 • 31
Atomic Layer Deposition of Nickel on ZnO Nanowire Arrays for High-Performance Supercapacitors
Ren, Q.-H. and Zhang, Y. and Lu, H.-L. and Wang, Y.-P. and Liu, W.-J. and Ji, X.-M. and Devi, A. and Jiang, A.-Q. and Zhang, D.W.
ACS APPLIED MATERIALS AND INTERFACES. Volume: 10 (2018) - 2017 • 30
Transport mechanisms through PE-CVD coatings: Influence of temperature, coating properties and defects on permeation of water vapour
Kirchheim, D. and Jaritz, M. and Mitschker, F. and Gebhard, M. and Brochhagen, M. and Hopmann, C. and Böke, M. and Devi, A. and Awakowicz, P. and Dahlmann, R.
JOURNAL OF PHYSICS D: APPLIED PHYSICS. Volume: 50 (2017) - 2017 • 29
Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence
Mitschker, F. and Steves, S. and Gebhard, M. and Rudolph, M. and Schücke, L. and Kirchheim, D. and Jaritz, M. and Brochhagen, M. and Hoppe, C. and Dahlmann, R. and Böke, M. and Benedikt, J. and Giner, I. and De los Arcos, T. and Hopmann, C. and Grundmeier, G. and Devi, A. and Awakowicz, P.
JOURNAL OF PHYSICS D: APPLIED PHYSICS. Volume: 50 (2017) - 2017 • 28
Molecular Engineering of MnII Diamine Diketonate Precursors for the Vapor Deposition of Manganese Oxide Nanostructures
Maccato, C. and Bigiani, L. and Carraro, G. and Gasparotto, A. and Seraglia, R. and Kim, J. and Devi, A. and Tabacchi, G. and Fois, E. and Pace, G. and Di Noto, V. and Barreca, D.
CHEMISTRY - A EUROPEAN JOURNAL. Volume: 23 (2017) - 2017 • 27
Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition
O'Donoghue, R. and Rechmann, J. and Aghaee, M. and Rogalla, D. and Becker, H.-W. and Creatore, M. and Wieck, A.D. and Devi, A.
DALTON TRANSACTIONS. Volume: 46 (2017) - 2017 • 26
Effects of Post Annealing Treatments on the Interfacial Chemical Properties and Band Alignment of AlN/Si Structure Prepared by Atomic Layer Deposition
Sun, L. and Lu, H. and Chen, H. and Wang, T. and Ji, X. and Liu, W. and Zhao, D. and Devi, A. and Ding, S. and Zhang, D. W.
NANOSCALE RESEARCH LETTERS. Volume: 12 (2017) - 2017 • 25
Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development
Mai, L. and Gebhard, M. and de los Arcos, T. and Giner, I. and Mitschker, F. and Winter, M. and Parala, H. and Awakowicz, P. and Grundmeier, G. and Devi, A.
CHEMISTRY - A EUROPEAN JOURNAL. Volume: 23 (2017) - 2017 • 24
Atomic/molecular layer deposition of hybrid inorganic–organic thin films from erbium guanidinate precursor
Mai, L. and Giedraityte, Z. and Schmidt, M. and Rogalla, D. and Scholz, S. and Wieck, A.D. and Devi, A. and Karppinen, M.
JOURNAL OF MATERIALS SCIENCE. Volume: 52 (2017) - 2017 • 23
Tailored Mesoporous Carbon/Vanadium Pentoxide Hybrid Electrodes for High Power Pseudocapacitive Lithium and Sodium Intercalation
Fleischmann, S. and Leistenschneider, D. and Lemkova, V. and Krüner, B. and Zeiger, M. and Borchardt, L. and Presser, V.
CHEMISTRY OF MATERIALS. Volume: 29 (2017) - 2017 • 22
Review Article: Recommended reading list of early publications on atomic layer deposition - Outcome of the "virtual Project on the History of ALD"
Ahvenniemi, E. and Akbashev, A.R. and Ali, S. and Bechelany, M. and Berdova, M. and Boyadjiev, S. and Cameron, D.C. and Chen, R. and Chubarov, M. and Cremers, V. and Devi, A. and Drozd, V. and Elnikova, L. and Gottardi, G. and Grigoras, K. and Hausmann, D.M. and Hwang, C.S. and Jen, S.-H. and Kallio, T. and Kanervo, J. and Khmelnitskiy, I. and Kim, D.H. and Klibanov, L. and Koshtyal, Y. and Krause, A.O.I. and Kuhs, J. and Kärkkänen, I. and Kääriäinen, M.-L. and Kääriäinen, T. and Lamagna, L. and Łapicki, A.A. and Leskelä, M. and Lipsanen, H. and Lyytinen, J. and Malkov, A. and Malygin, A. and Mennad, A. and Militzer, C. and Molarius, J. and Norek, M. and Özgit-Akgün, Ç. and Panov, M. and Pedersen, H. and Piallat, F. and Popov, G. and Puurunen, R.L. and Rampelberg, G. and Ras, R.H.A. and Rauwel, E. and Roozeboom, F. and Sajavaara, T. and Salami, H. and Savin, H. and Schneider, N. and Seidel, T.E. and Sundqvist, J. and Suyatin, D.B. and Törndahl, T. and Van Ommen, J.R. and Wiemer, C. and Ylivaara, O.M.E. and Yurkevich, O.
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A: VACUUM, SURFACES AND FILMS. Volume: 35 (2017) - 2017 • 21
Nanostructured Fe2O3 Processing via Water-Assisted ALD and Low-Temperature CVD from a Versatile Iron Ketoiminate Precursor
Peeters, D. and Sadlo, A. and Lowjaga, K. and Mendoza Reyes, O. and Wang, L. and Mai, L. and Gebhard, M. and Rogalla, D. and Becker, H.-W. and Giner, I. and Grundmeier, G. and Mitoraj, D. and Grafen, M. and Ostendorf, A. and Beranek, R. and Devi, A.
ADVANCED MATERIALS INTERFACES. Volume: (2017) - 2017 • 20
Low-Temperature Atomic Layer Deposition of Cobalt Oxide as an Effective Catalyst for Photoelectrochemical Water-Splitting Devices
Kim, J. and Iivonen, T. and Hämäläinen, J. and Kemell, M. and Meinander, K. and Mizohata, K. and Wang, L. and Räisänen, J. and Beranek, R. and Leskelä, M. and Devi, A.
CHEMISTRY OF MATERIALS. Volume: 29 (2017) - 2016 • 19
Atomic-layer-controlled deposition of TEMAZ/O2-ZrO2 oxidation resistance inner surface coatings for solid oxide fuel cells
Keuter, T. and Mauer, G. and Vondahlen, F. and Iskandar, R. and Menzler, N.H. and Vaßen, R.
SURFACE AND COATINGS TECHNOLOGY. Volume: 288 (2016) - 2016 • 18
Nano fabricated silicon nanorod array with titanium nitride coating for on-chip supercapacitors
Lu, P. and Ohlckers, P. and Müller, L. and Leopold, S. and Hoffmann, M. and Grigoras, K. and Ahopelto, J. and Prunnila, M. and Chen, X.
ELECTROCHEMISTRY COMMUNICATIONS. Volume: 70 (2016) - 2016 • 17
Systematic molecular engineering of Zn-ketoiminates for application as precursors in atomic layer depositions of zinc oxide
O'Donoghue, R. and Peeters, D. and Rogalla, D. and Becker, H.-W. and Rechmann, J. and Henke, S. and Winter, M. and Devi, A.
DALTON TRANSACTIONS. Volume: 45 (2016) - 2016 • 16
An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
Gebhard, M. and Mitschker, F. and Wiesing, M. and Giner, I. and Torun, B. and De Los Arcos, T. and Awakowicz, P. and Grundmeier, G. and Devi, A.
JOURNAL OF MATERIALS CHEMISTRY C. Volume: 4 (2016) - 2015 • 15
Modeling precursor diffusion and reaction of atomic layer deposition in porous structures
Keuter, T. and Menzler, N.H. and Mauer, G. and Vondahlen, F. and Vaßen, R. and Buchkremer, H.P.
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A: VACUUM, SURFACES AND FILMS. Volume: 33 (2015) - 2014 • 14
Recent advances using guanidinate ligands for Chemical Vapour Deposition (CVD) and Atomic Layer Deposition (ALD) applications
Kurek, A. and Gordon, P.G. and Karle, S. and Devi, A. and Barry, S.T.
AUSTRALIAN JOURNAL OF CHEMISTRY. Volume: 67 (2014) - 2014 • 13
Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
Dang, V.-S. and Parala, H. and Kim, J.H. and Xu, K. and Srinivasan, N.B. and Edengeiser, E. and Havenith, M. and Wieck, A.D. and De Los Arcos, T. and Fischer, R.A. and Devi, A.
PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE. Volume: 211 (2014) - 2014 • 12
Self-directed localization of ZIF-8 thin film formation by conversion of ZnO nanolayers
Khaletskaya, K. and Turner, S. and Tu, M. and Wannapaiboon, S. and Schneemann, A. and Meyer, R. and Ludwig, Al. and Van Tendeloo, G. and Fischer, R.A.
ADVANCED FUNCTIONAL MATERIALS. Volume: 24 (2014) - 2014 • 11
Indium-tris-guanidinates: A promising class of precursors for water assisted atomic layer deposition of In2O3 thin films
Gebhard, M. and Hellwig, M. and Parala, H. and Xu, K. and Winter, M. and Devi, A.
DALTON TRANSACTIONS. Volume: 43 (2014) - 2014 • 10
Atomic layer deposition of TiO2 and ZrO2 thin films using heteroleptic guanidinate precursors
Kaipio, M. and Blanquart, T. and Banerjee, M. and Xu, K. and Niinistö, J. and Longo, V. and Mizohata, K. and Devi, A. and Ritala, M. and Leskelä, M.
CHEMICAL VAPOR DEPOSITION. Volume: 20 (2014) - 2013 • 9
Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water: Process optimization, film analysis and electrical properties
Xu, K. and Chaudhuri, A.R. and Parala, H. and Schwendt, D. and Arcos, T.D.L. and Osten, H.J. and Devi, A.
JOURNAL OF MATERIALS CHEMISTRY C. Volume: 1 (2013) - 2013 • 8
Growth and crystallization of TiO2 thin films by atomic layer deposition using a novel amido guanidinate titanium source and tetrakis-dimethylamido-titanium
Reiners, M. and Xu, K. and Aslam, N. and Devi, A. and Waser, R. and Hoffmann-Eifert, S.
CHEMISTRY OF MATERIALS. Volume: 25 (2013) - 2013 • 7
Zr(NEtMe)2(guan-NEtMe2)2] as a novel atomic layer deposition precursor: ZrO2 film growth and mechanistic studies
Blanquart, T. and Niinistö, J. and Aslam, N. and Banerjee, M. and Tomczak, Y. and Gavagnin, M. and Longo, V. and Puukilainen, E. and Wanzenboeck, H.D. and Kessels, W.M.M. and Devi, A. and Hoffmann-Eifert, S. and Ritala, M. and Leskelä, M.
CHEMISTRY OF MATERIALS. Volume: 25 (2013) - 2012 • 6
Atomic layer deposition of HfO 2 thin films employing a heteroleptic hafnium precursor
Xu, K. and Milanov, A.P. and Parala, H. and Wenger, C. and Baristiran-Kaynak, C. and Lakribssi, K. and Toader, T. and Bock, C. and Rogalla, D. and Becker, H.-W. and Kunze, U. and Devi, A.
CHEMICAL VAPOR DEPOSITION. Volume: 18 (2012) - 2012 • 5
Atomic layer deposition of Gd 2O 3 and Dy 2O 3: A study of the ALD characteristics and structural and electrical properties
Xu, K. and Ranjith, R. and Laha, A. and Parala, H. and Milanov, A.P. and Fischer, R.A. and Bugiel, E. and Feydt, J. and Irsen, S. and Toader, T. and Bock, C. and Rogalla, D. and Osten, H.-J. and Kunze, U. and Devi, A.
CHEMISTRY OF MATERIALS. Volume: 24 (2012) - 2011 • 4
Basic investigation of HfO2 based metal-insulator-metal diodes
Dudek, P. and Schmidt, R. and Lukosius, M. and Lupina, G. and Wenger, C. and Abrutis, A. and Albert, M. and Xu, K. and Devi, A.
THIN SOLID FILMS. Volume: 519 (2011) - 2010 • 3
Growth of crystalline Gd2O3 thin films with a high-quality interface on Si(100) by low-temperature H2O-assisted atomic layer deposition
Milanov, A.P. and Xu, K. and Laha, A. and Bugiel, E. and Ranjith, R. and Schwendt, D. and Osten, H.J. and Parala, H. and Fischer, R.A. and Devi, A.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY. Volume: 132 (2010) - 2010 • 2
Downscaling of defect-passivated Gd2O3 thin films on p-Si(0 0 1) wafers grown by H2O-assisted atomic layer deposition
Ranjith, R. and Laha, A. and Bugiel, E. and Osten, H.J. and Xu, K. and Milanov, A.P. and Devi, A.
SEMICONDUCTOR SCIENCE AND TECHNOLOGY. Volume: 25 (2010) - 2010 • 1
Can insulating the gates lead us to stable modulation-doped hole quantum devices?
Waddington, D. and Burke, A.M. and Fricke, S. and Tan, H.H. and Jagadish, C. and Hamilton, A.R. and Trunov, K. and Reuter, D. and Wieck, A.D. and Micolich, A.P.
CONFERENCE ON OPTOELECTRONIC AND MICROELECTRONIC MATERIALS AND DEVICES, PROCEEDINGS, COMMAD. Volume: (2010)