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Home » Research » Research at MRD » Publications

- Ruhr-Universität Bochum

Scientific output

Publications

Over 8.000 scientific papers have been published by members of the MRD since the foundation of the MRD in 2009. This tremendous output is proof of the excellent research acieved in an interdisciplinary environment.

 

Below, you can either scroll through the complete list of our annually published research in peer-reviewed journals or search for a specific author or keyword via the free text search.

Interactive keyword cloud:

  • aluminum
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  • binary alloys
  • carbon
  • catalysis
  • catalysts
  • chemistry
  • copper
  • deformation
  • density functional theory
  • deposition
  • electrochemistry
  • electrodes
  • grain boundaries
  • high resolution transmission electron microscopy
  • hydrogen
  • manganese
  • mechanical properties
  • microstructure
  • molecular dynamics
  • nanoparticles
  • nickel
  • oxidation
  • oxygen
  • scanning electron microscopy
  • single crystals
  • temperature
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  • 2024 • 350
    Equiatomic CoCrFeNi Thin Films on C-Sapphire: The Role of Twins and Orientation Relationships
    Kini, M. K. and Lee, S. and Savan, A. and Breitbach, B. and Ghidelli, M. and Ludwig, A. and Scheu, C. and Chatain, D. and Best, J. P. and Dehm, G.
    ADVANCED ENGINEERING MATERIALS. Volume: 26 (2024)
    10.1002/adem.202400720
  • 2024 • 349
    The Influence of Annealing on the Compositional and Crystallographic Properties of Sputtered Li–Al–O Thin Films
    Lourens, F. and Rogalla, D. and Suhr, E. and Ludwig, A.
    ADVANCED ENGINEERING MATERIALS. Volume: 26 (2024)
    10.1002/adem.202400602
  • 2024 • 348
    Structural and Hydrogen Evolution Electrocatalysis Properties of Cr–Al–B MAB Phase Thin Films
    Mockute, A. and Kostka, A. and Abdellaoui, L. and Krysiak, O. and Schuhmann, W. and Scheu, C. and Ludwig, A.
    ADVANCED ENGINEERING MATERIALS. Volume: 26 (2024)
    10.1002/adem.202401063
  • 2024 • 347
    A potential mechanism for abnormal grain growth in Ni thin films on c-sapphire
    Chatain, D. and Courtois, B. and Ahmad, S. and Dehm, G. and Scheu, C. and Badie, C. and Santinacci, L.
    ACTA MATERIALIA. Volume: 281 (2024)
    10.1016/j.actamat.2024.120451
  • 2024 • 346
    PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films
    de los Arcos, T. and Awakowicz, P. and Böke, M. and Boysen, N. and Brinkmann, R. P. and Dahlmann, R. and Devi, A. and Eremin, D. and Franke, J. and Gergs, T. and Jenderny, J. and Kemaneci, E. and Kühne, T. D. and Kusmierz, S. and Mussenbrock, T. and Rubner, J. and Trieschmann, J. and Wessling, M. and Xie, X. and Zanders, D. and Zysk, F. and Grundmeier, G.
    PLASMA PROCESSES AND POLYMERS. Volume: 21 (2024)
    10.1002/ppap.202300186
  • 2024 • 345
    Ni-Alloyed Copper Iodide Thin Films: Microstructural Features and Functional Performance
    Dethloff, C. and Thieme, K. and Selle, S. and Seifert, M. and Vogt, S. and Splith, D. and Botti, S. and Grundmann, M. and Lorenz, M.
    PHYSICA STATUS SOLIDI (B) BASIC RESEARCH. Volume: 261 (2024)
    10.1002/pssb.202300492
  • 2024 • 344
    Phase formation and electrical properties of reactively sputtered Fe1−x O thin films
    Evertz, S. and Nicolin, N. and Cheng, N. and Primetzhofer, D. and Best, J.P. and Dehm, G.
    JOURNAL OF PHYSICS D: APPLIED PHYSICS. Volume: 57 (2024)
    10.1088/1361-6463/ad0a3e
  • 2023 • 343
    High-speed thin-film lithium niobate quantum processor driven by a solid-state quantum emitter
    Sund, P. I. and Lomonte, E. and Paesani, S. and Wang, Y. and Carolan, J. and Bart, N. and Wieck, A. D. and Ludwig, A. and Midolo, L. and Pernice, W. H.P. and Lodahl, P. and Lenzini, F.
    SCIENCE ADVANCES. Volume: 9 (2023)
    10.1126/sciadv.adg7268
  • 2023 • 342
    Measuring Thermal Diffusivity of Azoheteroarene Thin Layers by Photothermal Beam Deflection and Photothermal Lens Methods
    Mikaeeli, A. and Korte, D. and Cabrera, H. and Chomicki, D. and Dziczek, D. and Kharchenko, O. and Song, P. and Liu, J. and Wieck, A. D. and Pawlak, M.
    MATERIALS. Volume: 16 (2023)
    10.3390/ma16186312
  • 2023 • 341
    Numerical and experimental studies on crack nucleation and propagation in thin films
    Harandi, A. and Rezaei, S. and Karimi Aghda, S. and Du, C. and Brepols, T. and Dehm, G. and Schneider, J. M. and Reese, S.
    INTERNATIONAL JOURNAL OF MECHANICAL SCIENCES. Volume: 258 (2023)
    10.1016/j.ijmecsci.2023.108568
  • 2023 • 340
    Silver Thin-Film Electrodes Grown by Low-Temperature Plasma-Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure
    Hasselmann, T. and Misimi, B. and Boysen, N. and Zanders, D. and Wree, J. and Rogalla, D. and Haeger, T. and Zimmermann, F. and Brinkmann, K. O. and Schädler, S. and Theirich, D. and Heiderhoff, R. and Devi, A. and Riedl, T.
    ADVANCED MATERIALS TECHNOLOGIES. Volume: 8 (2023)
    10.1002/admt.202200796
  • 2023 • 339
    PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films
    de los Arcos, T. and Awakowicz, P. and Böke, M. and Boysen, N. and Brinkmann, R. P. and Dahlmann, R. and Devi, A. and Eremin, D. and Franke, J. and Gergs, T. and Jenderny, J. and Kemaneci, E. and Kühne, T. D. and Kusmierz, S. and Mussenbrock, T. and Rubner, J. and Trieschmann, J. and Wessling, M. and Xie, X. and Zanders, D. and Zysk, F. and Grundmeier, G.
    PLASMA PROCESSES AND POLYMERS. Volume: (2023)
    10.1002/ppap.202300186
  • 2023 • 338
    The role of incoherent twin boundaries on the plasticity of Cu micropillars
    Hosseinabadi, R. and Brognara, A. and Kirchlechner, C. and Best, J. P. and Dehm, G.
    MATERIALS AND DESIGN. Volume: 232 (2023)
    10.1016/j.matdes.2023.112164
  • 2023 • 337
    Role of Ag segregation on microscale strengthening and slip transmission in an asymmetric Σ5 copper grain boundary
    Bhat, M. K. and Sukumar, P. T. and Langenohl, L. and Best, J. P. and Dehm, G.
    ACTA MATERIALIA. Volume: 255 (2023)
    10.1016/j.actamat.2023.119081
  • 2023 • 336
    Unusual Phase Formation in Reactively Sputter-Deposited La—Co—O Thin-Film Libraries
    Piotrowiak, T. H. and Zehl, R. and Suhr, E. and Banko, L. and Kohnen, B. and Rogalla, D. and Ludwig, A.
    ADVANCED ENGINEERING MATERIALS. Volume: 25 (2023)
    10.1002/adem.202201050
  • 2023 • 335
    Decoupling the electrical resistivity contribution of grain boundaries in dilute Fe-alloyed Cu thin films
    Bishara, H. and Langenohl, L. and Zhou, X. and Gault, B. and Best, J.P. and Dehm, G.
    SCRIPTA MATERIALIA. Volume: 230 (2023)
    10.1016/j.scriptamat.2023.115393
  • 2023 • 334
    Mechanical properties and thermal stability of ZrCuAlx thin film metallic glasses: Experiments and first-principle calculations
    Poltronieri, C. and Brognara, A. and Bignoli, F. and Evertz, S. and Djemia, P. and Faurie, D. and Challali, F. and Li, C.H. and Belliard, L. and Dehm, G. and Best, J.P. and Ghidelli, M.
    ACTA MATERIALIA. Volume: 258 (2023)
    10.1016/j.actamat.2023.119226
  • 2023 • 333
    Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al2O3 atomic layer deposition
    Xie, X. and Zanders, D. and Preischel, F. and de los Arcos, T. and Devi, A. and Grundmeier, G.
    SURFACE AND INTERFACE ANALYSIS. Volume: 55 (2023)
    10.1002/sia.7256
  • 2023 • 332
    Interplay of Precursor and Plasma for The Deposition of HfO2 via PEALD: Film Growth and Dielectric Properties
    Preischel, F. and Zanders, D. and Berning, T. and Kostka, A. and Rogalla, D. and Bock, C. and Devi, A.
    ADVANCED MATERIALS INTERFACES. Volume: 10 (2023)
    10.1002/admi.202300244
  • 2023 • 331
    Optical properties of Agx Cu1- x I alloy thin films
    Krüger, E. and Seifert, M. and Gottschalch, V. and Krautscheid, H. and Schnohr, C. S. and Botti, S. and Grundmann, M. and Sturm, C.
    AIP ADVANCES. Volume: 13 (2023)
    10.1063/5.0137091
  • 2023 • 330
    Effect of stiff substrates on enhancing the fracture resistance of Barium Titanate thin films
    Mathews, N. G. and Lambai, A. and Mohanty, G. and Venkataramani, N. and Dehm, G. and Jaya, B. N.
    MATERIALS AND DESIGN. Volume: 235 (2023)
    10.1016/j.matdes.2023.112440
  • 2022 • 329
    High-Performance Iridium Thin Films for Water Splitting by CVD Using New Ir(I) Precursors
    Boysen, N. and Wree, J.-L. and Zanders, D. and Rogalla, D. and Öhl, D. and Schuhmann, W. and Devi, A.
    ACS APPLIED MATERIALS AND INTERFACES. Volume: 14 (2022)
    10.1021/acsami.2c13865
  • 2022 • 328
    Low-temperature ALD/MLD growth of alucone and zincone thin films from non-pyrophoric precursors
    Philip, A. and Mai, L. and Ghiyasi, R. and Devi, A. and Karppinen, M.
    DALTON TRANSACTIONS. Volume: 51 (2022)
    10.1039/d2dt02279f
  • 2022 • 327
    Unusual Phase Formation in Reactively Sputter-Deposited La—Co—O Thin-Film Libraries
    Piotrowiak, T.H. and Zehl, R. and Suhr, E. and Banko, L. and Kohnen, B. and Rogalla, D. and Ludwig, Al.
    ADVANCED ENGINEERING MATERIALS. Volume: (2022)
    10.1002/adem.202201050
  • 2022 • 326
    Microstructure and residual stress evolution in nanocrystalline Cu-Zr thin films
    Chakraborty, J. and Oellers, T. and Raghavan, R. and Ludwig, A. and Dehm, G.
    JOURNAL OF ALLOYS AND COMPOUNDS. Volume: 896 (2022)
    10.1016/j.jallcom.2021.162799
  • 2022 • 325
    Selective Anodic Oxidation of Solketal as Acetal-Protected Glycerol over Nickel Boride in Alkaline Media to Glyceric Acid**
    Cychy, S. and Lechler, S. and Muhler, M.
    CHEMELECTROCHEM. Volume: 9 (2022)
    10.1002/celc.202101214
  • 2022 • 324
    Combinatorial sputter deposition of CrMnFeCoNi high entropy alloy thin films on agitated particles
    Lourens, F. and Ludwig, Al.
    SURFACE AND COATINGS TECHNOLOGY. Volume: 449 (2022)
    10.1016/j.surfcoat.2022.128984
  • 2022 • 323
    Influence of surface activation on the microporosity of PE-CVD and PE-ALD SiOx thin films on PDMS
    Hoppe, C. and Mitschker, F. and Mai, L. and Liedke, M.O. and de los Arcos, T. and Awakowicz, P. and Devi, A. and Attallah, A.G. and Butterling, M. and Wagner, A. and Grundmeier, G.
    PLASMA PROCESSES AND POLYMERS. Volume: (2022)
    10.1002/ppap.202100174
  • 2022 • 322
    One-Dimensional Water Structures upon Cs Hydration on the Moiré Pattern of Graphitic ZnO
    Hung, T.-C. and Morgenstern, K.
    JOURNAL OF PHYSICAL CHEMISTRY C. Volume: 126 (2022)
    10.1021/acs.jpcc.2c05166
  • 2022 • 321
    Exploring stability of a nanoscale complex solid solution thin film by in situ heating transmission electron microscopy
    Manjón, A.G. and Zhang, S. and Völker, B. and Meischein, M. and Ludwig, Al. and Scheu, C.
    MRS BULLETIN. Volume: (2022)
    10.1557/s43577-021-00217-x
  • 2022 • 320
    Microstructure, grain boundary evolution and anisotropic Fe segregation in (0001) textured Ti thin films
    Devulapalli, V. and Hans, M. and Sukumar, P.T. and Schneider, J.M. and Dehm, G. and Liebscher, C.H.
    ACTA MATERIALIA. Volume: 238 (2022)
    10.1016/j.actamat.2022.118180
  • 2022 • 319
    Multiscale characterization of damage tolerance in barium titanate thin films
    Mathews, N.G. and Saxena, A.K. and Venkataramani, N. and Dehm, G. and Jaya, B.N.
    JOURNAL OF APPLIED PHYSICS. Volume: 132 (2022)
    10.1063/5.0095139
  • 2022 • 318
    Strategies for damage tolerance enhancement in metal/ceramic thin films: Lessons learned from Ti/TiN
    Mishra, A.K. and Gopalan, H. and Hans, M. and Kirchlechner, C. and Schneider, J.M. and Dehm, G. and Jaya, B.N.
    ACTA MATERIALIA. Volume: 228 (2022)
    10.1016/j.actamat.2022.117777
  • 2022 • 317
    Ferromagnetic Cobalt Disulfide: A CVD Pathway Toward High-Quality and Phase-Pure Thin Films
    Wree, J.-L. and Glauber, J.-P. and Zanders, D. and Rogalla, D. and Becher, M. and Griffiths, M.B.E. and Ostendorf, A. and Barry, S.T. and Ney, A. and Devi, A.
    ACS APPLIED ELECTRONIC MATERIALS. Volume: 4 (2022)
    10.1021/acsaelm.2c00685
  • 2022 • 316
    Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide Thin Films at Low Temperatures for Hydrogen Gas Sensing
    Wree, J.-L. and Rogalla, D. and Ostendorf, A. and Schierbaum, K.D. and Devi, A.
    ACS APPLIED MATERIALS AND INTERFACES. Volume: (2022)
    10.1021/acsami.2c19827
  • 2022 • 315
    Atomic/molecular layer deposition of cerium(iii) hybrid thin films using rigid organic precursors
    Kaur, P. and Muriqi, A. and Wree, J.-L. and Ghiyasi, R. and Safdar, M. and Nolan, M. and Karppinen, M. and Devi, A.
    DALTON TRANSACTIONS. Volume: 51 (2022)
    10.1039/d2dt00353h
  • 2022 • 314
    Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction
    Zanders, D. and Obenlüneschloß, J. and Wree, J.-L. and Jagosz, J. and Kaur, P. and Boysen, N. and Rogalla, D. and Kostka, A. and Bock, C. and Öhl, D. and Gock, M. and Schuhmann, W. and Devi, A.
    ADVANCED MATERIALS INTERFACES. Volume: (2022)
    10.1002/admi.202201709
  • 2022 • 313
    Ferromagnetic Europium Sulfide Thin Films: Influence of Precursors on Magneto-Optical Properties
    Beer, S.M.J. and Muriqi, A. and Lindner, P. and Winter, M. and Rogalla, D. and Nolan, M. and Ney, A. and Debus, J. and Devi, A.
    CHEMISTRY OF MATERIALS. Volume: 34 (2022)
    10.1021/acs.chemmater.1c02958
  • 2022 • 312
    Molecular dynamics study on the role of Ar ions in the sputter deposition of Al thin films
    Gergs, T. and Mussenbrock, T. and Trieschmann, J.
    JOURNAL OF APPLIED PHYSICS. Volume: 132 (2022)
    10.1063/5.0098040
  • 2022 • 311
    Linear growth of reaction layer during in-situ TEM annealing of thin film Al/Ni diffusion couples
    Kostka, A. and Naujoks, D. and Oellers, T. and Salomon, S. and Somsen, C. and Öztürk, E. and Savan, A. and Ludwig, A. and Eggeler, G.
    JOURNAL OF ALLOYS AND COMPOUNDS. Volume: 922 (2022)
    10.1016/j.jallcom.2022.165926
  • 2022 • 310
    Effect of hybridization in PdAlY-(Ni/Au/Ir) metallic glasses thin films on electrical resistivity
    Bishara, H. and Kontis, P. and Dehm, G. and Schneider, J.M. and Evertz, S.
    SCRIPTA MATERIALIA. Volume: 214 (2022)
    10.1016/j.scriptamat.2022.114681
  • 2021 • 309
    Optimizing the nickel boride layer thickness in a spectroelectrochemical ATR-FTIR thin-film flow cell applied in glycerol oxidation
    Cychy, S. and Lechler, S. and Huang, Z. and Braun, M. and Brix, A.C. and Blümler, P. and Andronescu, C. and Schmid, F. and Schuhmann, W. and Muhler, M.
    CHINESE JOURNAL OF CATALYSIS. Volume: 42 (2021)
    10.1016/S1872-2067(20)63766-4
  • 2021 • 308
    Structure and hardness of in situ synthesized nano-oxide strengthened CoCrFeNi high entropy alloy thin films
    Lee, S. and Chatain, D. and Liebscher, C.H. and Dehm, G.
    SCRIPTA MATERIALIA. Volume: 203 (2021)
    10.1016/j.scriptamat.2021.114044
  • 2021 • 307
    Influence of substrates and e-beam evaporation parameters on the microstructure of nanocrystalline and epitaxially grown Ti thin films
    Devulapalli, V. and Bishara, H. and Ghidelli, M. and Dehm, G. and Liebscher, C.H.
    APPLIED SURFACE SCIENCE. Volume: 562 (2021)
    10.1016/j.apsusc.2021.150194
  • 2021 • 306
    Combinatorial exploration of B2/L21 precipitation strengthened AlCrFeNiTi compositionally complex alloys
    Wolff-Goodrich, S. and Marshal, A. and Pradeep, K.G. and Dehm, G. and Schneider, J.M. and Liebscher, C.H.
    JOURNAL OF ALLOYS AND COMPOUNDS. Volume: 853 (2021)
    10.1016/j.jallcom.2020.156111
  • 2021 • 305
    Sensing and electrocatalytic activity of tungsten disulphide thin films fabricated via metal-organic chemical vapour deposition
    Wree, J.-L. and Glauber, J.-P. and Öhl, D. and Niesen, A. and Kostka, A. and Rogalla, D. and Schuhmann, W. and Devi, A.
    JOURNAL OF MATERIALS CHEMISTRY C. Volume: 9 (2021)
    10.1039/d1tc02417e
  • 2021 • 304
    Mechanism of amorphous phase stabilization in ultrathin films of monoatomic phase change material
    Dragoni, D. and Behler, J. and Bernasconi, M.
    NANOSCALE. Volume: 13 (2021)
    10.1039/d1nr03432d
  • 2021 • 303
    Phase constitution of the noble metal thin-film complex solid solution system Ag-Ir-Pd-Pt-Ru in dependence of elemental compositions and annealing temperatures
    Xiao, B. and Wang, X. and Savan, A. and Ludwig, Al.
    NANO RESEARCH. Volume: (2021)
    10.1007/s12274-021-3516-7
  • 2021 • 302
    Fabrication of Gd: XFeyOzfilms using an atomic layer deposition-type approach
    Yu, P. and Beer, S.M.J. and Devi, A. and Coll, M.
    CRYSTENGCOMM. Volume: 23 (2021)
    10.1039/d0ce01252a
  • 2021 • 301
    Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for Low-Resistivity Co Thin Films
    Zanders, D. and Liu, J. and Obenlüneschloß, J. and Bock, C. and Rogalla, D. and Mai, L. and Nolan, M. and Barry, S.T. and Devi, A.
    CHEMISTRY OF MATERIALS. Volume: (2021)
    10.1021/acs.chemmater.1c00877
  • 2021 • 300
    A study on the influence of ligand variation on formamidinate complexes of yttrium: New precursors for atomic layer deposition of yttrium oxide
    Beer, S.M.J. and Boysen, N. and Muriqi, A. and Zanders, D. and Berning, T. and Rogalla, D. and Bock, C. and Nolan, M. and Devi, A.
    DALTON TRANSACTIONS. Volume: 50 (2021)
    10.1039/d1dt01634b
  • 2021 • 299
    CVD grown GaSbxN1-xfilms as visible-light active photoanodes
    Zywitzki, D. and Mitoraj, D. and Vilk, Y. and Mendoza Reyes, O. and Schleuning, M. and Friedrich, D. and Sadlo, A. and Rogalla, D. and Eichberger, R. and Beranek, R. and Devi, A.
    DALTON TRANSACTIONS. Volume: 50 (2021)
    10.1039/d1dt02455h
  • 2021 • 298
    Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties
    Zywitzki, D. and Schaper, R. and Ciftyürek, E. and Wree, J.-L. and Taffa, D.H. and Baier, D.M. and Rogalla, D. and Li, Y. and Meischein, M. and Ludwig, A. and Li, Z. and Schierbaum, K. and Wark, M. and Devi, A.
    ADVANCED MATERIALS INTERFACES. Volume: 8 (2021)
    10.1002/admi.202100949
  • 2021 • 297
    Effect of synthesis temperature on the phase formation of NiTiAlFeCr compositionally complex alloy thin films
    Marshal, A. and Singh, P. and Music, D. and Wolff-Goodrich, S. and Evertz, S. and Schökel, A. and Johnson, D.D. and Dehm, G. and Liebscher, C.H. and Schneider, J.M.
    JOURNAL OF ALLOYS AND COMPOUNDS. Volume: 854 (2021)
    10.1016/j.jallcom.2020.155178
  • 2021 • 296
    Novel approach to study diffusion of hydrogen bearing species in silicate glasses at low temperatures
    Bissbort, T. and Becker, H.-W. and Fanara, S. and Chakraborty, S.
    CHEMICAL GEOLOGY. Volume: 562 (2021)
    10.1016/j.chemgeo.2020.120037
  • 2021 • 295
    Link between Structural and Optical Properties of CoxFe3- xO4Nanoparticles and Thin Films with Different Co/Fe Ratios
    Kampermann, L. and Klein, J. and Korte, J. and Kowollik, O. and Pfingsten, O. and Smola, T. and Saddeler, S. and Piotrowiak, T.H. and Salamon, S. and Landers, J. and Wende, H. and Ludwig, A. and Schulz, S. and Bacher, G.
    JOURNAL OF PHYSICAL CHEMISTRY C. Volume: (2021)
    10.1021/acs.jpcc.0c11277
  • 2021 • 294
    Link between Structural and Optical Properties of CoxFe3-xO4Nanoparticles and Thin Films with Different Co/Fe Ratios
    Kampermann, L. and Klein, J. and Korte, J. and Kowollik, O. and Pfingsten, O. and Smola, T. and Saddeler, S. and Piotrowiak, T.H. and Salamon, S. and Landers, J. and Wende, H. and Ludwig, A. and Schulz, S. and Bacher, G.
    JOURNAL OF PHYSICAL CHEMISTRY C. Volume: 125 (2021)
    10.1021/acs.jpcc.0c11277
  • 2021 • 293
    Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application
    Kaur, P. and Mai, L. and Muriqi, A. and Zanders, D. and Ghiyasi, R. and Safdar, M. and Boysen, N. and Winter, M. and Nolan, M. and Karppinen, M. and Devi, A.
    CHEMISTRY - A EUROPEAN JOURNAL. Volume: 27 (2021)
    10.1002/chem.202003907
  • 2021 • 292
    Atomic layer deposition of dielectric Y2O3thin films from a homoleptic yttrium formamidinate precursor and water
    Boysen, N. and Zanders, D. and Berning, T. and Beer, S.M.J. and Rogalla, D. and Bock, C. and Devi, A.
    RSC ADVANCES. Volume: 11 (2021)
    10.1039/d0ra09876k
  • 2021 • 291
    Nanocrystalline equiatomic CoCrFeNi alloy thin films: Are they single phase fcc?
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    JOURNAL OF MATERIALS RESEARCH. Volume: (2018)
    10.1557/jmr.2018.214
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    Antibacterial Efficacy of Sacrifical Anode Thin Films Combining Silver with Platinum Group Elements within a Bacteria-Containing Human Plasma Clot
    Abuayyash, A. and Ziegler, N. and Gessmann, J. and Sengstock, C. and Schildhauer, T.A. and Ludwig, Al. and Köller, M.
    ADVANCED ENGINEERING MATERIALS. Volume: 20 (2018)
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    Martensitic transformation hysteresis in Ni(Co)-Mn-Sn/MgO metamagnetic shape memory thin films
    Alexandrakis, V. and Aseguinolaza, I.R. and Decker, P. and Salomon, S. and Barandiarán, J.M. and Ludwig, Al. and Chernenko, V.A.
    SCRIPTA MATERIALIA. Volume: 156 (2018)
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    Femtosecond laser crystallization of amorphous titanium oxide thin films
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    APPLIED PHYSICS LETTERS. Volume: 113 (2018)
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    Effect of Pt and Au current collector in LiMn2O4 thin film for micro-batteries
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    NANOTECHNOLOGY. Volume: 29 (2018)
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    Water assisted atomic layer deposition of yttrium oxide using tris(N,N0-diisopropyl-2-dimethylamido-guanidinato) yttrium(III): Process development, film characterization and functional properties†
    Mai, L. and Boysen, N. and Subaşı, E. and De Los Arcos, T. and Rogalla, D. and Grundmeier, G. and Bock, C. and Lu, H.-L. and Devi, A.
    RSC ADVANCES. Volume: 8 (2018)
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    Towards sustainable chlorate production: The effect of permanganate addition on current efficiency
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    JOURNAL OF CLEANER PRODUCTION. Volume: 182 (2018)
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    Tailored β-Ketoiminato Complexes of Iron: Synthesis, Characterization, and Evaluation towards Solution-Based Deposition of Iron Oxide Thin Films
    Sadlo, A. and Beer, S.M.J. and Rahman, S. and Grafen, M. and Rogalla, D. and Winter, M. and Ostendorf, A. and Devi, A.
    EUROPEAN JOURNAL OF INORGANIC CHEMISTRY. Volume: 2018 (2018)
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    Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Properties
    Mattinen, M. and Wree, J.-L. and Stegmann, N. and Ciftyurek, E. and Achhab, M.E. and King, P.J. and Mizohata, K. and Räisänen, J. and Schierbaum, K.D. and Devi, A. and Ritala, M. and Leskelä, M.
    CHEMISTRY OF MATERIALS. Volume: 30 (2018)
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    New amidinate complexes of indium(III): Promising CVD precursors for transparent and conductive In2O3 thin films
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    DALTON TRANSACTIONS. Volume: 46 (2017)
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    Review Article: Unraveling synergistic effects in plasma-surface processes by means of beam experiments
    Von Keudell, A. and Corbella, C.
    JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A: VACUUM, SURFACES AND FILMS. Volume: 35 (2017)
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    Antibacterial activity of microstructured sacrificial anode thin films by combination of silver with platinum group elements (platinum, palladium, iridium)
    Köller, M. and Bellova, P. and Javid, S.M. and Motemani, Y. and Khare, C. and Sengstock, C. and Tschulik, K. and Schildhauer, T.A. and Ludwig, Al.
    MATERIALS SCIENCE AND ENGINEERING C. Volume: 74 (2017)
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    Identification of a ternary μ-phase in the Co-Ti-W system – An advanced correlative thin-film and bulk combinatorial materials investigation
    Naujoks, D. and Eggeler, Y.M. and Hallensleben, P. and Frenzel, J. and Fries, S.G. and Palumbo, M. and Koßmann, J. and Hammerschmidt, T. and Pfetzing-Micklich, J. and Eggeler, G. and Spiecker, E. and Drautz, R. and Ludwig, Al.
    ACTA MATERIALIA. Volume: 138 (2017)
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    Formation of nanometer-sized Cu-Sn-Se particles in Cu2ZnSnSe4 thin-films and their effect on solar cell efficiency
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    ACTA MATERIALIA. Volume: 132 (2017)
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    High-throughput heterodyne thermoreflectance: Application to thermal conductivity measurements of a Fe-Si-Ge thin film alloy library
    D'Acremont, Q. and Pernot, G. and Rampnoux, J.-M. and Furlan, A. and Lacroix, D. and Ludwig, Al. and Dilhaire, S.
    REVIEW OF SCIENTIFIC INSTRUMENTS. Volume: 88 (2017)
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    High-throughput study of binary thin film tungsten alloys
    Nikolić, V. and Wurster, S. and Savan, A. and Ludwig, Al. and Pippan, R.
    INTERNATIONAL JOURNAL OF REFRACTORY METALS AND HARD MATERIALS. Volume: 69 (2017)
    10.1016/j.ijrmhm.2017.07.017
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    Stability, phase separation and oxidation of a supersaturated nanocrystalline Cu-33 at.% Cr thin film alloy
    Harzer, T.P. and Dehm, G.
    THIN SOLID FILMS. Volume: 623 (2017)
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    Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition
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    DALTON TRANSACTIONS. Volume: 46 (2017)
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    Photoactive Zinc Ferrites Fabricated via Conventional CVD Approach
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    Microstructural evolution and solid state dewetting of epitaxial Al thin films on sapphire (α-Al2O3)
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    ACTA MATERIALIA. Volume: 133 (2017)
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    Annealing induced void formation in epitaxial Al thin films on sapphire (α-Al2O3)
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    ACTA MATERIALIA. Volume: 140 (2017)
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    Origin of Structural Modulations in Ultrathin Fe Films on Cu(001)
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    PHYSICAL REVIEW LETTERS. Volume: 118 (2017)
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    Electronic structure of metastable bcc Cu-Cr alloy thin films: Comparison of electron energy-loss spectroscopy and first-principles calculations
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    ULTRAMICROSCOPY. Volume: 178 (2017)
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    Influence of organic surface chemistry on the nucleation of plasma deposited SiOx films
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    JOURNAL OF PHYSICS D: APPLIED PHYSICS. Volume: 50 (2017)
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    A correlative investigation of grain boundary crystallography and electronic properties in CdTe thin film solar cells
    Stechmann, G. and Zaefferer, S. and Schwarz, T. and Konijnenberg, P. and Raabe, D. and Gretener, C. and Kranz, L. and Perrenoud, J. and Buecheler, S. and Nath Tiwari, A.
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    Combinatorial study of Fe-Co-V hard magnetic thin films
    Fackler, S.W. and Alexandrakis, V. and König, D. and Kusne, A.G. and Gao, T. and Kramer, M.J. and Stasak, D. and Lopez, K. and Zayac, B. and Mehta, A. and Ludwig, Al. and Takeuchi, I.
    SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS. Volume: 18 (2017)
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    Diffusion across the glass transition in silicate melts: Systematic correlations, new experimental data for Sr and Ba in calcium-aluminosilicate glasses and general mechanisms of ionic transport
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    JOURNAL OF NON-CRYSTALLINE SOLIDS. Volume: 455 (2017)
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    Maintaining strength in supersaturated copper–chromium thin films annealed at 0.5 of the melting temperature of Cu
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    JOURNAL OF MATERIALS SCIENCE. Volume: 52 (2017)
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    Atomic/molecular layer deposition of hybrid inorganic–organic thin films from erbium guanidinate precursor
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    JOURNAL OF MATERIALS SCIENCE. Volume: 52 (2017)
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    Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development
    Mai, L. and Gebhard, M. and de los Arcos, T. and Giner, I. and Mitschker, F. and Winter, M. and Parala, H. and Awakowicz, P. and Grundmeier, G. and Devi, A.
    CHEMISTRY - A EUROPEAN JOURNAL. Volume: 23 (2017)
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    Effect of annealing on the size dependent deformation behavior of thin cobalt films on flexible substrates
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    THIN SOLID FILMS. Volume: 624 (2017)
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    Synthesis and evaluation of new copper ketoiminate precursors for a facile and additive-free solution-based approach to nanoscale copper oxide thin films
    Karle, S. and Rogalla, D. and Ludwig, A. and Becker, H. and Wieck, A. D. and Grafen, M. and Ostendorf, A. and Devi, A.
    DALTON TRANSACTIONS. Volume: 46 (2017)
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    Graphene oxide reduction induced by femtosecond laser irradiation
    Kasischke, M. and Maragkaki, S. and Volz, S. and Gurevich, E.L. and Ostendorf, A.
    PROCEEDINGS OF SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING. Volume: 10356 (2017)
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    Influence of Substrate Temperature and Film Thickness on Thermal, Electrical, and Structural Properties of HPPMS and DC Magnetron Sputtered Ge Thin Films
    Furlan, A. and Grochla, D. and D'Acremont, Q. and Pernot, G. and Dilhaire, S. and Ludwig, Al.
    ADVANCED ENGINEERING MATERIALS. Volume: (2017)
    10.1002/adem.201600854
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    In Situ Characterization of Ultrathin Films by Scanning Electrochemical Impedance Microscopy
    Estrada-Vargas, A. and Bandarenka, A. and Kuznetsov, V. and Schuhmann, W.
    ANALYTICAL CHEMISTRY. Volume: 88 (2016)
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    Strain-induced phase transformation of a thin Co film on flexible substrates
    Marx, V.M. and Kirchlechner, C. and Breitbach, B. and Cordill, M.J. and Többens, D.M. and Waitz, T. and Dehm, G.
    ACTA MATERIALIA. Volume: 121 (2016)
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    PHYSICS PROCEDIA. Volume: 83 (2016)
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    Benchmarking the Performance of Thin-Film Oxide Electrocatalysts for Gas Evolution Reactions at High Current Densities
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    ACS CATALYSIS. Volume: 6 (2016)
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    An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
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    JOURNAL OF MATERIALS CHEMISTRY C. Volume: 4 (2016)
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    Synthesis of nanostructured LiMn2O4 thin films by glancing angle deposition for Li-ion battery applications
    Borhani-Haghighi, S. and Khare, C. and Trócoli, R. and Dushina, A. and Kieschnick, M. and Lamantia, F. and Ludwig, Al.
    NANOTECHNOLOGY. Volume: 27 (2016)
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    Nanostructured Ti-Ta thin films synthesized by combinatorial glancing angle sputter deposition
    Motemani, Y. and Khare, C. and Savan, A. and Hans, M. and Paulsen, A. and Frenzel, J. and Somsen, C. and Mücklich, F. and Eggeler, G. and Ludwig, Al.
    NANOTECHNOLOGY. Volume: 27 (2016)
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    Tuning the Cell Adhesion on Biofunctionalized Nanoporous Organic Frameworks
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    Screening of material libraries for electrochemical CO2 reduction catalysts – Improving selectivity of Cu by mixing with Co
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    Impact of lattice dynamics on the phase stability of metamagnetic FeRh: Bulk and thin films
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    Combining sensor and protective functionalities in ferromagnetic nanocomposite thin films for applications in harsh environments
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    ADVANCED ENGINEERING MATERIALS. Volume: 18 (2016)
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    Structural and multifunctional properties of magnetron-sputtered Fe-P(-Mn) thin films
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    THIN SOLID FILMS. Volume: 603 (2016)
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    3-Dimensional microstructural characterization of CdTe absorber layers from CdTe/CdS thin film solar cells
    Stechmann, G. and Zaefferer, S. and Konijnenberg, P. and Raabe, D. and Gretener, C. and Kranz, L. and Perrenoud, J. and Buecheler, S. and Tiwari, A.N.
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    New materials for the light-induced hydrogen evolution reaction from the Cu-Si-Ti-O system
    Stein, H.S. and Gutkowski, R. and Siegel, A. and Schuhmann, W. and Ludwig, Al.
    JOURNAL OF MATERIALS CHEMISTRY A. Volume: 4 (2016)
    10.1039/c5ta10186g
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    A structure zone diagram obtained by simultaneous deposition on a novel step heater: A case study for Cu2O thin films
    Stein, H. and Naujoks, D. and Grochla, D. and Khare, C. and Gutkowski, R. and Grützke, S. and Schuhmann, W. and Ludwig, Al.
    PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE. Volume: 212 (2015)
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    Molecular-scale hybridization of clay monolayers and conducting polymer for thin-film supercapacitors
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    ADVANCED FUNCTIONAL MATERIALS. Volume: 25 (2015)
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    High-Quality Solution-Processed Silicon Oxide Gate Dielectric Applied on Indium Oxide Based Thin-Film Transistors
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    ACS APPLIED MATERIALS AND INTERFACES. Volume: 7 (2015)
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    Transition from shear to stress-assisted diffusion of copper-chromium nanolayered thin films at elevated temperatures
    Raghavan, R. and Wheeler, J.M. and Harzer, T.P. and Chawla, V. and Djaziri, S. and Thomas, K. and Philippi, B. and Kirchlechner, C. and Jaya, B.N. and Wehrs, J. and Michler, J. and Dehm, G.
    ACTA MATERIALIA. Volume: 100 (2015)
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    Comparing small scale plasticity of copper-chromium nanolayered and alloyed thin films at elevated temperatures
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    The influence of a brittle Cr interlayer on the deformation behavior of thin Cu films on flexible substrates: Experiment and model
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    Metal-organic CVD of Y2O3 Thin Films using Yttrium tris-amidinates
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    ECS TRANSACTIONS. Volume: 68 (2015)
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    Combinatorial synthesis and high-throughput characterization of the thin film materials system Co-Mn-Ge: Composition, structure, and magnetic properties
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    PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE. Volume: 212 (2015)
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    MOCVD of TiO2 thin films from a modified titanium alkoxide precursor
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    ADVANCED ENGINEERING MATERIALS. Volume: 17 (2015)
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    Antibacterial activity of microstructured Ag/Au sacrificial anode thin films
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    MATERIALS SCIENCE AND ENGINEERING C. Volume: 46 (2015)
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    Exploration of ternary subsystems of superalloys by high-throughput thin film experimentation: Optical and electrical data of the Co-Al-W system
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    MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS. Volume: 1760 (2015)
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    X-ray photoelectron spectroscopy investigations of the surface reaction layer and its effects on the transformation properties of nanoscale Ti51Ni38Cu11 shape memory thin films
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    Three-Dimensional, Fibrous Lithium Iron Phosphate Structures Deposited by Magnetron Sputtering
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    Rare-earth substituted HfO2 thin films grown by metalorganic chemical vapor deposition
    Devi, A. and Cwik, S. and Xu, K. and Milanov, A.P. and Noei, H. and Wang, Y. and Barreca, D. and Meijer, J. and Rogalla, D. and Kahn, D. and Cross, R. and Parala, H. and Paul, S.
    THIN SOLID FILMS. Volume: 520 (2012)
    10.1016/j.tsf.2011.10.141
  • 2012 • 89
    Characteristics of ceramic coatings made by thin film low pressure plasma spraying (LPPS-TF)
    Hospach, A. and Mauer, G. and Vaßen, R. and Stöver, D.
    JOURNAL OF THERMAL SPRAY TECHNOLOGY. Volume: 21 (2012)
    10.1007/s11666-012-9748-z
  • 2012 • 88
    Dehydrogenase-Based Reagentless Biosensors: Electrochemically Assisted Deposition of Sol-Gel Thin Films on Functionalized Carbon Nanotubes
    Wang, Z. and Etienne, M. and Pöller, S. and Schuhmann, W. and Kohring, G.-W. and Mamane, V. and Walcarius, A.
    ELECTROANALYSIS. Volume: 24 (2012)
    10.1002/elan.201100574
  • 2012 • 87
    Sc 2O 3, Er 2O 3, and Y 2O 3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors
    Milanov, A.P. and Xu, K. and Cwik, S. and Parala, H. and De Los Arcos, T. and Becker, H.-W. and Rogalla, D. and Cross, R. and Paul, S. and Devi, A.
    DALTON TRANSACTIONS. Volume: 41 (2012)
    10.1039/c2dt31219k
  • 2012 • 86
    Fabrication of ZrO 2 and ZrN films by metalorganic chemical vapor deposition employing new Zr precursors
    Banerjee, M. and Srinivasan, N.B. and Zhu, H. and Kim, S.J. and Xu, K. and Winter, M. and Becker, H.-W. and Rogalla, D. and De Los Arcos, T. and Bekermann, D. and Barreca, D. and Fischer, R.A. and Devi, A.
    CRYSTAL GROWTH AND DESIGN. Volume: 12 (2012)
    10.1021/cg3010147
  • 2012 • 85
    Structural and magnetic properties of Co 2MnSi thin films
    Belmeguenai, M. and Zighem, F. and Faurie, D. and Tuzcuoglu, H. and Chérif, S.-M. and Moch, P. and Westerholt, K. and Seiler, W.
    PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE. Volume: 209 (2012)
    10.1002/pssa.201228039
  • 2012 • 84
    Incubation effect and its influence on laser patterning of ITO thin film
    Xiao, S. and Gurevich, E.L. and Ostendorf, A.
    APPLIED PHYSICS A: MATERIALS SCIENCE AND PROCESSING. Volume: 107 (2012)
    10.1007/s00339-012-6820-y
  • 2012 • 83
    Selective Ablation of Thin Films by Ultrashort Laser Pulses
    Xiao, S. Z. and Schops, B. and Ostendorf, A.
    LASER ASSISTED NET SHAPE ENGINEERING 7 (LANE 2012). Volume: 39 (2012)
    10.1016/j.phpro.2012.10.078
  • 2012 • 82
    Atomic layer deposition of HfO 2 thin films employing a heteroleptic hafnium precursor
    Xu, K. and Milanov, A.P. and Parala, H. and Wenger, C. and Baristiran-Kaynak, C. and Lakribssi, K. and Toader, T. and Bock, C. and Rogalla, D. and Becker, H.-W. and Kunze, U. and Devi, A.
    CHEMICAL VAPOR DEPOSITION. Volume: 18 (2012)
    10.1002/cvde.201106934
  • 2012 • 81
    Atomic layer deposition of Gd 2O 3 and Dy 2O 3: A study of the ALD characteristics and structural and electrical properties
    Xu, K. and Ranjith, R. and Laha, A. and Parala, H. and Milanov, A.P. and Fischer, R.A. and Bugiel, E. and Feydt, J. and Irsen, S. and Toader, T. and Bock, C. and Rogalla, D. and Osten, H.-J. and Kunze, U. and Devi, A.
    CHEMISTRY OF MATERIALS. Volume: 24 (2012)
    10.1021/cm2020862
  • 2012 • 80
    Dual frequency capacitive plasmas in Fe and Ni sputter applications: Correlation of discharge properties on thin film properties
    Bienholz, S. and Semmler, E. and Awakowicz, P. and Brunken, H. and Ludwig, Al.
    PLASMA SOURCES SCIENCE AND TECHNOLOGY. Volume: 21 (2012)
    10.1088/0963-0252/21/1/015010
  • 2012 • 79
    Strain-induced phase transitions in epitaxial NaNbO3 thin films grown by metal-organic chemical vapour deposition
    Schwarzkopf, J. and Schmidbauer, M. and Remmele, T. and Duk, A. and Kwasniewski, A. and Bin Anooz, S. and Devi, A. and Fornari, R.
    JOURNAL OF APPLIED CRYSTALLOGRAPHY. Volume: 45 (2012)
    10.1107/S0021889812035911
  • 2012 • 78
    High mobility ZnO thin film transistors using the novel deposition of high-k dielectrics
    Ngwashi, D.K. and Cross, R.B.M. and Paul, S. and Milanov, A.P. and Devi, A.
    MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS. Volume: 1315 (2012)
    10.1557/opl.2011.721
  • 2012 • 77
    Thickness-dependence of the B2-B19 martensitic transformation in nanoscale shape memory alloy thin films: Zero-hysteresis in 75 nm thick Ti 51Ni38Cu11 thin films
    König, D. and Buenconsejo, P.J.S. and Grochla, D. and Hamann, S. and Pfetzing-Micklich, J. and Ludwig, Al.
    ACTA MATERIALIA. Volume: 60 (2012)
    10.1016/j.actamat.2011.09.037
  • 2012 • 76
    Deposition of La 1-xSr xFe 1-yCo yO 3-δ coatings with different phase compositions and microstructures by low-pressure plasma spraying-thin film (LPPS-TF) processes
    Zotov, N. and Hospach A. and Mauer G. and Sebold D. and Vaßen, R.
    JOURNAL OF THERMAL SPRAY TECHNOLOGY. Volume: 21 (2012)
    10.1007/s11666-012-9768-8
  • 2011 • 75
    Enhanced photoelectrochemical properties of WO3 thin films fabricated by reactive magnetron sputtering
    Vidyarthi, V.S. and Hofmann, M. and Savan, A. and Sliozberg, K. and König, D. and Beranek, R. and Schuhmann, W. and Ludwig, Al.
    INTERNATIONAL JOURNAL OF HYDROGEN ENERGY. Volume: 36 (2011)
    10.1016/j.ijhydene.2011.01.087
  • 2011 • 74
    Columnar-structured thermal barrier coatings (TBCs) by thin film low-pressure plasma spraying (LPPS-TF)
    Hospach, A. and Mauer, G. and Vaßen, R. and Stöver, D.
    JOURNAL OF THERMAL SPRAY TECHNOLOGY. Volume: 20 (2011)
    10.1007/s11666-010-9549-1
  • 2011 • 73
    Stepwise deposition of metal organic frameworks on flexible synthetic polymer surfaces
    Meilikhov, M. and Yusenko, K. and Schollmeyer, E. and Mayer, C. and Buschmann, H.-J. and Fischer, R.A.
    DALTON TRANSACTIONS. Volume: 40 (2011)
    10.1039/c0dt01820a
  • 2011 • 72
    High-throughput characterization of Pt supported on thin film oxide material libraries applied in the oxygen reduction reaction
    Schäfer, D. and Mardare, C. and Savan, A. and Sanchez, M.D. and Mei, B. and Xia, W. and Muhler, M. and Ludwig, Al. and Schuhmann, W.
    ANALYTICAL CHEMISTRY. Volume: 83 (2011)
    10.1021/ac102303u
  • 2011 • 71
    Reversible fcc ↔ bcc transformation in freestanding epitaxially grown Fe-Pd ferromagnetic shape memory films
    Edler, T. and Hamann, S. and Ludwig, Al. and Mayr, S.G.
    SCRIPTA MATERIALIA. Volume: 64 (2011)
    10.1016/j.scriptamat.2010.09.013
  • 2011 • 70
    Strongly oriented Co3O4 thin films on MgO(100) and MgAl2O4(100) substrates by PE-CVD
    Barreca, D. and Devi, A. and Fischer, R.A. and Bekermann, D. and Gasparotto, A. and Gavagnin, M. and MacCato, C. and Tondello, E. and Bontempi, E. and Depero, L.E. and Sada, C.
    CRYSTENGCOMM. Volume: 13 (2011)
    10.1039/c1ce05280b
  • 2011 • 69
    Small-scale deposition of thin films and nanoparticles by microevaporation sources
    Meyer, R. and Hamann, S. and Ehmann, M. and König, D. and Thienhaus, S. and Savan, A. and Ludwig, Al.
    JOURNAL OF MICROELECTROMECHANICAL SYSTEMS. Volume: 20 (2011)
    10.1109/JMEMS.2010.2090506
  • 2011 • 68
    Malonate complexes of dysprosium: Synthesis, characterization and application for LI-MOCVD of dysprosium containing thin films
    Milanov, A.P. and Seidel, R.W. and Barreca, D. and Gasparotto, A. and Winter, M. and Feydt, J. and Irsen, S. and Becker, H.-W. and Devi, A.
    DALTON TRANSACTIONS. Volume: 40 (2011)
    10.1039/c0dt00455c
  • 2011 • 67
    Picosecond laser direct patterning of poly (3,4-ethylene dioxythiophene)-poly (styrene sulfonate) (PEDOT:PSS) thin films
    Xiao, S. and Abreu Fernandes, S. and Esen, C. and Ostendorf, A.
    JOURNAL OF LASER MICRO NANOENGINEERING. Volume: 6 (2011)
    10.2961/jlmn.2011.03.0015
  • 2011 • 66
    Liquid-phase epitaxy of multicomponent layer-based porous coordination polymer thin films of [M(L)(P)0.5] type: Importance of deposition sequence on the oriented growth
    Zacher, D. and Yusenko, K. and Bétard, A. and Henke, S. and Molon, M. and Ladnorg, T. and Shekhah, O. and Schüpbach, B. and Dea Losa Arcos, T. and Krasnopolski, M. and Meilikhov, M. and Winter, J. and Terfort, A. and Wöll, C. and Fischer, R.A.
    CHEMISTRY - A EUROPEAN JOURNAL. Volume: 17 (2011)
    10.1002/chem.201002381
  • 2011 • 65
    High-throughput characterization of mechanical properties of Ti-Ni-Cu shape memory thin films at elevated temperature
    Zarnetta, R. and Kneip, S. and Somsen, C. and Ludwig, Al.
    MATERIALS SCIENCE AND ENGINEERING A. Volume: 528 (2011)
    10.1016/j.msea.2011.05.006
  • 2011 • 64
    Magnetotransport properties of Cu2MnAl, Co2MnGe, and Co2MnSi Heusler alloy thin films: From nanocrystalline disordered state to long-range-ordered crystalline state
    Obaida, M. and Westerholt, K. and Zabel, H.
    PHYSICAL REVIEW B - CONDENSED MATTER AND MATERIALS PHYSICS. Volume: 84 (2011)
    10.1103/PhysRevB.84.184416
  • 2011 • 63
    Interdiffusion in Fe/Pt multilayers: In situ high temperature synchrotron radiation reflectivity study
    Zotov, N. and Feydt, J. and Savan, A. and Ludwig, Al. and Von Borany, J.
    ADVANCED ENGINEERING MATERIALS. Volume: 13 (2011)
    10.1002/adem.201000358
  • 2011 • 62
    Oxygen chemisorption, formation, and thermal stability of Pt oxides on Pt nanoparticles supported on SiO2/Si(001): Size effects
    Ono, L.K. and Croy, J.R. and Heinrich, H. and Roldan Cuenya, B.
    JOURNAL OF PHYSICAL CHEMISTRY C. Volume: 115 (2011)
    10.1021/jp204743q
  • 2011 • 61
    Phase transformation, structural and functional fatigue properties of Ti-Ni-Hf shape memory thin films
    König, D. and Zarnetta, R. and Savan, A. and Brunken, H. and Ludwig, Al.
    ACTA MATERIALIA. Volume: 59 (2011)
    10.1016/j.actamat.2011.01.066
  • 2011 • 60
    High-throughput characterization of the seebeck coefficient of a-(Cr 1 - XSix)1 - yOy thin film materials libraries as verification of the extended thermopower formula
    Sonntag, J. and Ziolkowski, P. and Savan, A. and Kieschnick, M. and Ludwig, Al.
    JOURNAL OF PHYSICS CONDENSED MATTER. Volume: 23 (2011)
    10.1088/0953-8984/23/26/265501
  • 2011 • 59
    The effects of grain size on the phase transformation properties of annealed (Ti/Ni/W) shape memory alloy multilayers
    Buenconsejo, P.J.S. and Zarnetta, R. and Ludwig, Al.
    SCRIPTA MATERIALIA. Volume: 64 (2011)
    10.1016/j.scriptamat.2011.02.021
  • 2011 • 58
    A new prototype two-phase (TiNi)-(β-W) SMA system with tailorable thermal hysteresis
    Buenconsejo, P.J.S. and Zarnetta, R. and König, D. and Savan, A. and Thienhaus, S. and Ludwig, Al.
    ADVANCED FUNCTIONAL MATERIALS. Volume: 21 (2011)
    10.1002/adfm.201001697
  • 2011 • 57
    Induced magnetic Cu moments and magnetic ordering in Cu2MnAl thin films on MgO(0 0 1) observed by XMCD
    Krumme, B. and Herper, H.C. and Erb, D. and Weis, C. and Antoniak, C. and Warland, A. and Westerholt, K. and Entel, P. and Wende, H.
    JOURNAL OF PHYSICS D: APPLIED PHYSICS. Volume: 44 (2011)
    10.1088/0022-3727/44/41/415004
  • 2011 • 56
    A novel high-throughput fatigue testing method for metallic thin films
    Burger, S. and Eberl, C. and Siegel, A. and Ludwig, Al. and Kraft, O.
    SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS. Volume: 12 (2011)
    10.1088/1468-6996/12/5/054202
  • 2011 • 55
    Fatigue testing of thin films
    Burger, S. and Rupp, B. and Ludwig, Al. and Kraft, O. and Eberl, C.
    KEY ENGINEERING MATERIALS. Volume: 465 (2011)
    10.4028/www.scientific.net/KEM.465.552
  • 2011 • 54
    X-ray photoelectron spectroscopy on implanted argon as a tool to follow local structural changes in thin films
    Lahrood, A. R. and de los Arcos, T. and Prenzel, M. and von Keudell, A. and Winter, J.
    THIN SOLID FILMS. Volume: 520 (2011)
    10.1016/j.tsf.2011.07.040
  • 2011 • 53
    High-throughput characterization of film thickness in thin film materials libraries by digital holographic microscopy
    Lai, Y.W. and Krause, M. and Savan, A. and Thienhaus, S. and Koukourakis, N. and Hofmann, M.R. and Ludwig, Al.
    SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS. Volume: 12 (2011)
    10.1088/1468-6996/12/5/054201
  • 2011 • 52
    High-throughput characterization of stresses in thin film materials libraries using Si cantilever array wafers and digital holographic microscopy
    Lai, Y.W. and Hamann, S. and Ehmann, M. and Ludwig, Al.
    REVIEW OF SCIENTIFIC INSTRUMENTS. Volume: 82 (2011)
    10.1063/1.3600594
  • 2011 • 51
    Plasma and optical thin film technologies
    Stenzel, O. and Wilbrandt, S. and Kaiser, N. and Schmitz, C. and Turowski, M. and Ristau, D. and Awakowicz, P. and Brinkmann, R.P. and Musch, T. and Rolfes, I. and Steffen, H. and Foest, R. and Ohl, A. and Köhler, T. and Dolgonos, G. and Frauenheim, T.
    PROCEEDINGS OF SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING. Volume: 8168 (2011)
    10.1117/12.895323
  • 2011 • 50
    Structural, optical, and magnetic properties of Ho-implanted GaN thin films
    Lo, F.-Y. and Guo, J.-Y. and Ney, V. and Ney, A. and Chern, M.-Y. and Melnikov, A. and Pezzagna, S. and Reuter, D. and Wieck, A.D. and Massies, J.
    JOURNAL OF PHYSICS: CONFERENCE SERIES. Volume: 266 (2011)
    10.1088/1742-6596/266/1/012097
  • 2011 • 49
    Evaluation of homoleptic guanidinate and amidinate complexes of gadolinium and dysprosium for MOCVD of rare-earth nitride thin films
    Thiede, T.B. and Krasnopolski, M. and Milanov, A.P. and De Los Arcos, T. and Ney, A. and Becker, H.-W. and Rogalla, D. and Winter, J. and Devi, A. and Fischer, R.A.
    CHEMISTRY OF MATERIALS. Volume: 23 (2011)
    10.1021/cm102840v
  • 2011 • 48
    Microstructure and adhesion of as-deposited and annealed Cu/Ti films on polyimide
    Cordill, M.J. and Taylor, A. and Schalko, J. and Dehm, G.
    INTERNATIONAL JOURNAL OF MATERIALS RESEARCH. Volume: 102 (2011)
    10.3139/146.110513
  • 2011 • 47
    Comparative study of hydrothermal treatment and thermal annealing effects on the properties of electrodeposited micro-columnar ZnO thin films
    Lupan, O. and Pauporté, T. and Tiginyanu, I.M. and Ursaki, V.V. and Şontea, V. and Ono, L.K. and Cuenya, B.R. and Chow, L.
    THIN SOLID FILMS. Volume: 519 (2011)
    10.1016/j.tsf.2011.05.072
  • 2011 • 46
    Grain resolved orientation changes and texture evolution in a thermally strained Al film on Si substrate
    Heinz, W. and Dehm, G.
    SURFACE AND COATINGS TECHNOLOGY. Volume: 206 (2011)
    10.1016/j.surfcoat.2011.07.046
  • 2011 • 45
    Atomic vapor deposition approach to In 2O 3 thin films
    Hellwig, M. and Parala, H. and Cybinksa, J. and Barreca, D. and Gasparotto, A. and Niermann, B. and Becker, H.-W. and Rogalla, D. and Feydt, J. and Irsen, S. and Mudring, A.-V. and Winter, J. and Fischer, R.A. and Devi, A.
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY. Volume: 11 (2011)
    10.1166/jnn.2011.5024
  • 2011 • 44
    Ultrathin metal oxidation for vacuum monitoring device applications
    Mäder, S. and Haas, T. and Kunze, U. and Doll, T.
    PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE. Volume: 208 (2011)
    10.1002/pssa.201000921
  • 2011 • 43
    Field cooling-induced magnetic anisotropy in exchange biased CoO/Fe bilayer studied by ferromagneticresonance
    Akdoǧan, N. and Kazan, S. and Akta, B. and Özdemir, M. and Inam, H. and Obaida, M. and Dudek, J. and Westerholt, K.
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS. Volume: 323 (2011)
    10.1016/j.jmmm.2010.09.037
  • 2010 • 42
    In situ TEM study of microplasticity and Bauschinger effect in nanocrystalline metals
    Rajagopalan, J. and Rentenberger, C. and Peter Karnthaler, H. and Dehm, G. and Saif, M.T.A.
    ACTA MATERIALIA. Volume: 58 (2010)
    10.1016/j.actamat.2010.05.013
  • 2010 • 41
    Downscaling of defect-passivated Gd2O3 thin films on p-Si(0 0 1) wafers grown by H2O-assisted atomic layer deposition
    Ranjith, R. and Laha, A. and Bugiel, E. and Osten, H.J. and Xu, K. and Milanov, A.P. and Devi, A.
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY. Volume: 25 (2010)
    10.1088/0268-1242/25/10/105001
  • 2010 • 40
    Microstructure and magnetic properties of FeCo/Ti thin film multilayers annealed in nitrogen
    Brunken, H. and Somsen, C. and Savan, A. and Ludwig, Al.
    THIN SOLID FILMS. Volume: 519 (2010)
    10.1016/j.tsf.2010.09.008
  • 2010 • 39
    A review of crystallographic textures in chemical vapor-deposited diamond films
    Liu, T. and Raabe, D. and Mao, W.-M.
    SIGNAL, IMAGE AND VIDEO PROCESSING. Volume: 4 (2010)
    10.1007/s11760-008-0099-7
  • 2010 • 38
    The ferromagnetic shape memory system Fe-Pd-Cu
    Hamann, S. and Gruner, M.E. and Irsen, S. and Buschbeck, J. and Bechtold, C. and Kock, I. and Mayr, S.G. and Savan, A. and Thienhaus, S. and Quandt, E. and Fähler, S. and Entel, P. and Ludwig, Al.
    ACTA MATERIALIA. Volume: 58 (2010)
    10.1016/j.actamat.2010.07.011
  • 2010 • 37
    Effects of annealing on properties of ZnO thin films prepared by electrochemical deposition in chloride medium
    Lupan, O. and Pauporté, T. and Chow, L. and Viana, B. and Pellé, F. and Ono, L.K. and Roldan Cuenya, B. and Heinrich, H.
    APPLIED SURFACE SCIENCE. Volume: 256 (2010)
    10.1016/j.apsusc.2009.10.032
  • 2010 • 36
    Investigation of the fatigue behavior of Al thin films with different microstructure
    Heinz, W. and Pippan, R. and Dehm, G.
    MATERIALS SCIENCE AND ENGINEERING A. Volume: 527 (2010)
    10.1016/j.msea.2010.08.046
  • 2010 • 35
    Adhesion energies of Cr thin films on polyimide determined from buckling: Experiment and model
    Cordill, M.J. and Fischer, F.D. and Rammerstorfer, F.G. and Dehm, G.
    ACTA MATERIALIA. Volume: 58 (2010)
    10.1016/j.actamat.2010.06.032
  • 2010 • 34
    Fracture and delamination of chromium thin films on polymer substrates
    Cordill, M.J. and Taylor, A. and Schalko, J. and Dehm, G.
    METALLURGICAL AND MATERIALS TRANSACTIONS A: PHYSICAL METALLURGY AND MATERIALS SCIENCE. Volume: 41 (2010)
    10.1007/s11661-009-9988-9
  • 2010 • 33
    Combinatorial investigation of Hf-Ta thin films and their anodic oxides
    Mardare, A.I. and Ludwig, Al. and Savan, A. and Wieck, A.D. and Hassel, A.W.
    ELECTROCHIMICA ACTA. Volume: 55 (2010)
    10.1016/j.electacta.2010.03.066
  • 2010 • 32
    Growth of crystalline Gd2O3 thin films with a high-quality interface on Si(100) by low-temperature H2O-assisted atomic layer deposition
    Milanov, A.P. and Xu, K. and Laha, A. and Bugiel, E. and Ranjith, R. and Schwendt, D. and Osten, H.J. and Parala, H. and Fischer, R.A. and Devi, A.
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY. Volume: 132 (2010)
    10.1021/ja909102j
  • 2010 • 31
    Growth and characterization of ti-ta-o thin films on si substrates by liquid injection MOCVD for high-k applications from modified titanium and tantalum precursors
    Devi, A. and Hellwig, M. and Barreca, D. and Parala, H. and Thomas, R. and Becker, H.-W. and Katiyar, R.S. and Fischer, R.A. and Tondello, E.
    CHEMICAL VAPOR DEPOSITION. Volume: 16 (2010)
    10.1002/cvde.200906813
  • 2010 • 30
    Identification of optimized Ti-Ni-Cu shape memory alloy compositions for high-frequency thin film microactuator applications
    Zarnetta, R. and Ehmann, M. and Savan, A. and Ludwig, Al.
    SMART MATERIALS AND STRUCTURES. Volume: 19 (2010)
    10.1088/0964-1726/19/6/065032
  • 2010 • 29
    Metal-free and electrocatalytically active nitrogen-doped carbon nanotubes synthesized by coating with polyaniline
    Jin, C. and Nagaiah, T.C. and Xia, W. and Spliethoff, B. and Wang, S. and Bron, M. and Schuhmann, W. and Muhler, M.
    NANOSCALE. Volume: 2 (2010)
    10.1039/b9nr00405j
  • 2010 • 28
    Depositions of SrRuO3 thin films on oxide substrates with liquid-delivery spin MOCVD
    Schwarzkopf, J. and Dirsyte, R. and Devi, A. and Schmidbauer, M. and Wagner, G. and Fornari, R.
    THIN SOLID FILMS. Volume: 518 (2010)
    10.1016/j.tsf.2009.12.057
  • 2010 • 27
    Thin films of the Heusler alloys Cu2MnAl and Co2MnSi: Recovery of ferromagnetism via solid-state crystallization from the x-ray amorphous state
    Erb, D. and Nowak, G. and Westerholt, K. and Zabel, H.
    JOURNAL OF PHYSICS D: APPLIED PHYSICS. Volume: 43 (2010)
    10.1088/0022-3727/43/28/285001
  • 2010 • 26
    Effects of annealing time on the structural and magnetic properties of L10 FePt thin films
    Zotov, N. and Hiergeist, R. and Savan, A. and Ludwig, Al.
    THIN SOLID FILMS. Volume: 518 (2010)
    10.1016/j.tsf.2010.03.076
  • 2010 • 25
    Epitaxially stabilized TiN/(Ti,Fe,Co)N multilayer thin films in (pseudo-)fcc crystal structure by sequential magnetron sputter deposition
    Klever, C. and Seemann, K. and Stüber, M. and Ulrich, S. and Brunken, H. and Ludwig, Al. and Leiste, H.
    JOURNAL OF PHYSICS D: APPLIED PHYSICS. Volume: 43 (2010)
    10.1088/0022-3727/43/39/395406
  • 2010 • 24
    Artificial single variant martensite in freestanding Fe70Pd 30 films obtained by coherent epitaxial growth
    Bechtold, C. and Buschbeck, J. and Lotnyk, A. and Erkartal, B. and Hamann, S. and Zamponi, C. and Schultz, L. and Ludwig, Al. and Kienle, L. and Fähler, S. and Quandt, E.
    ADVANCED MATERIALS. Volume: 22 (2010)
    10.1002/adma.201000599
  • 2010 • 23
    Volatile, monomeric, and fluorine-free precursors for the metal organic chemical vapor deposition of zinc oxide
    Bekermann, D. and Rogalla, D. and Becker, H.-W. and Winter, M. and Fischer, R.A. and Devi, A.
    EUROPEAN JOURNAL OF INORGANIC CHEMISTRY. Volume: (2010)
    10.1002/ejic.200901037
  • 2010 • 22
    Structural, static and dynamic magnetic properties of Co2MnGe thin films on a sapphire a-plane substrate
    Belmeguenai, M. and Zighem, F. and Chauveau, T. and Faurie, D. and Roussigń, Y. and Ch́rif, S.M. and Moch, P. and Westerholt, K. and Monod, P.
    JOURNAL OF APPLIED PHYSICS. Volume: 108 (2010)
    10.1063/1.3475501
  • 2010 • 21
    Micro- to nanostructured devices for the characterization of scaling effects in shape-memory thin films
    König, D. and Ehmann, M. and Thienhaus, S. and Ludwig, Al.
    JOURNAL OF MICROELECTROMECHANICAL SYSTEMS. Volume: 19 (2010)
    10.1109/JMEMS.2010.2067441
  • 2010 • 20
    Crystal orientation effects in scratch testing with a spherical Indenter
    Swadener, J.G. and Bögershausen, H. and Sander, B. and Raabe, D.
    JOURNAL OF MATERIALS RESEARCH. Volume: 25 (2010)
    10.1557/jmr.2010.0108
  • 2010 • 19
    Microplasticity phenomena in thermomechanically strained nickel thin films
    Taylor, A.A. and Oh, S.H. and Dehm, G.
    JOURNAL OF MATERIALS SCIENCE. Volume: 45 (2010)
    10.1007/s10853-010-4445-0
  • 2009 • 18
    MOCVD of gallium oxide thin films using homoleptic gallium complexes: Precursor evaluation and thin film characterisation
    Hellwig, M. and Xu, K. and Barreca, D. and Gasparotto, A. and Niermann, B. and Winter, J. and Becker, H.W. and Rogalla, D. and Fischer, R.A. and Devi, A.
    ECS TRANSACTIONS. Volume: 25 (2009)
    10.1149/1.3207648
  • 2009 • 17
    Novel gallium complexes with malonic diester anions as molecular precursors for the MOCVD of ga203 thin films
    Hellwig, M. and Ke, X. and Barreca, D. and Gasparotto, A. and Winter, M. and Tondello, E. and Fischer, R.A. and Devi, A.
    EUROPEAN JOURNAL OF INORGANIC CHEMISTRY. Volume: (2009)
    10.1002/ejic.200801062
  • 2009 • 16
    FMR studies of half metallic ferromagnetic thin films Co 2MnSn and Co 2MnGe
    Yilgin, R. and Kazan, S. and Rameev, B. and Aktas, B. and Westerholt, K.
    JOURNAL OF PHYSICS: CONFERENCE SERIES. Volume: 153 (2009)
    10.1088/1742-6596/153/1/012068
  • 2009 • 15
    R-phase formation in Ti39Ni45Cu16 shape memory thin films and bulk alloys discovered by combinatorial methods
    Zarnetta, R. and König, D. and Zamponi, C. and Aghajani, A. and Frenzel, J. and Eggeler, G. and Ludwig, Al.
    ACTA MATERIALIA. Volume: 57 (2009)
    10.1016/j.actamat.2009.05.014
  • 2009 • 14
    Influence of precipitates on the thermal hysteresis of Ti-Ni-Pd shape memory thin films
    Zarnetta, R. and Zelaya, E. and Eggeler, G. and Ludwig, Al.
    SCRIPTA MATERIALIA. Volume: 60 (2009)
    10.1016/j.scriptamat.2008.11.001
  • 2009 • 13
    Multifunctional FeCo/TiN multilayer thin films with combined magnetic and protective properties
    Klever, C. and Stüber, M. and Leiste, H. and Nold, E. and Seemann, K. and Ulrich, S. and Brunken, H. and Ludwig, Al. and Thede, C. and Quandt, E.
    ADVANCED ENGINEERING MATERIALS. Volume: 11 (2009)
    10.1002/adem.200900214
  • 2009 • 12
    Thermally oxidized Mn-Co thin films as protective coatings for SOFC interconnects
    Mardare, C.C. and Spiegel, M. and Savan, A. and Ludwig, Al.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY. Volume: 156 (2009)
    10.1149/1.3240597
  • 2009 • 11
    High-throughput study of the anodic oxidation of Hf-Ti thin films
    Mardare, A.I. and Ludwig, Al. and Savan, A. and Wieck, A.D. and Hassel, A.W.
    ELECTROCHIMICA ACTA. Volume: 54 (2009)
    10.1016/j.electacta.2009.01.016
  • 2009 • 10
    Interface fracture properties of thin films studied by using the micro-cantilever deflection technique
    Matoy, K. and Detzel, T. and Müller, M. and Motz, C. and Dehm, G.
    SURFACE AND COATINGS TECHNOLOGY. Volume: 204 (2009)
    10.1016/j.surfcoat.2009.09.013
  • 2009 • 9
    Anisotropy and dynamic properties of Co2MnGe Heusler thin films
    Belmeguenai, M. and Zighem, F. and Woltersdorf, G. and Roussigné, Y. and Chérif, S.M. and Westerholt, K. and Bayreuther, G.
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS. Volume: 321 (2009)
    10.1016/j.jmmm.2008.11.042
  • 2009 • 8
    Microstrip line ferromagnetic resonance and Brillouin light scattering investigations of magnetic properties of Co2MnGe Heusler thin films
    Belmeguenai, M. and Zighem, F. and Roussigné, Y. and Chérif, S.-M. and Moch, P. and Westerholt, K. and Woltersdorf, G. and Bayreuther, G.
    PHYSICAL REVIEW B - CONDENSED MATTER AND MATERIALS PHYSICS. Volume: 79 (2009)
    10.1103/PhysRevB.79.024419
  • 2009 • 7
    Capacitance-voltage analysis of ZrO2 thin films deposited by thermal MOCVD technique
    Mih, T.A. and Paul, S. and Milanov, A.P. and Bhakta, R. and Devi, A.
    ECS TRANSACTIONS. Volume: 25 (2009)
    10.1149/1.3207684
  • 2009 • 6
    Rare-earth based oxide and nitride thin films employing volatile homoleptic guanidinate precursors
    Milanov, A.P. and Thiede, T. and Hellwig, M. and Parala, H. and Bock, C. and Becker, H.-W. and Ngwashi, D.K. and Cross, R.B.M. and Paul, S. and Kunze, U. and Fischer, R.A. and Devi, A.
    ECS TRANSACTIONS. Volume: 25 (2009)
    10.1149/1.3207585
  • 2009 • 5
    Lanthanide oxide thin films by metalorganic chemical vapor deposition employing volatile guanidinate precursors
    Milanov, A.P. and Toader, T. and Parala, H. and Barreca, D. and Gasparotto, A. and Bock, C. and Becker, H.-W. and Ngwashi, D.K. and Cross, R. and Paul, S. and Kunze, U. and Fischer, R.A. and Devi, A.
    CHEMISTRY OF MATERIALS. Volume: 21 (2009)
    10.1021/cm902123m
  • 2009 • 4
    Homoleptic gadolinium guanidinate: A single source precursor for metal-organic chemical vapor deposition of gadolinium nitride thin films
    Milanov, A.P. and Thiede, T.B. and Devi, A. and Fischer, R.A.
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY. Volume: 131 (2009)
    10.1021/ja907952g
  • 2009 • 3
    Hafnium carbamates and ureates: New class of precursors for low-temperature growth of HfO2 thin films
    Pothiraja, R. and Milanov, A.P. and Barreca, D. and Gasparotto, A. and Becker, H.-W. and Winter, M. and Fischer, R.A. and Devi, A.
    CHEMICAL COMMUNICATIONS. Volume: (2009)
    10.1039/b821128k
  • 2009 • 2
    Monomeric malonate precursors for the MOCVD of HfO2 and ZrO 2 thin films
    Pothiraja, R. and Milanov, A. and Parala, H. and Winter, M. and Fischer, R.A. and Devi, A.
    DALTON TRANSACTIONS. Volume: (2009)
    10.1039/b810528f
  • 2009 • 1
    Can micro-compression testing provide stress-strain data for thin films?. A comparative study using Cu, VN, TiN and W coatings
    Dehm, G. and Wörgötter, H.P. and Cazottes, S. and Purswani, J.M. and Gall, D. and Mitterer, C. and Kiener, D.
    THIN SOLID FILMS. Volume: 518 (2009)
    10.1016/j.tsf.2009.09.070
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